Decomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films
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چکیده
منابع مشابه
Decomposition and nanocrystallization in reactively sputtered amorphous Ta–Si–N thin films
The nanocrystallization process of reactively sputtered thin amorphous Ta–Si–N films is investigated by anomalous small angle x-ray scattering ~ASAXS! and x-ray diffraction ~XRD!. Changes in the microstructure in Ta40Si14N46 films, density variations in the amorphous matrix, decomposition, formation, and growth of nanocrystals after vacuum anneals at different temperatures in the range between ...
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ژورنال
عنوان ژورنال: Journal of Applied Physics
سال: 2001
ISSN: 0021-8979,1089-7550
DOI: 10.1063/1.1388173